Abstract
Film deposition and high-resolution patterning of ionic liquids (ILs) remain a challenge, despite a broad range of applications that would benefit from this type of processing. Here, we demonstrate for the first time the chemical vapor deposition (CVD) of ILs. The IL-CVD method is based on the formation of a non-volatile IL through the reaction of two vaporized precursors. Ionogel micropatterns can be easily obtained via the combination of IL-CVD and standard photolithography, and the resulting microdrop arrays can be used as microreactors. The IL-CVD approach will facilitate leveraging the properties of ILs in a range of applications and microfabricated devices.
Original language | English |
---|---|
Pages (from-to) | 1-5 |
Number of pages | 5 |
Journal | Angewandte Chemie - International Edition |
Volume | 60 |
Issue number | 49 |
DOIs | |
Publication status | Published - 3 Sept 2021 |
Keywords
- chemical vapor deposition
- ionic liquid
- ionogel
- micropattern
- photolitography