TY - JOUR
T1 - Direct X-ray and electron-beam lithography of halogenated zeolitic imidazolate frameworks
AU - Tu, Min
AU - Xia, Benzheng
AU - Kravchenko, Dmitry E.
AU - Tietze, Max Lutz
AU - Cruz, Alexander John
AU - Stassen, Ivo
AU - Hauffman, Tom
AU - Teyssandier, Joan
AU - De Feyter, Steven
AU - Wang, Zheng
AU - Fischer, Roland A.
AU - Marmiroli, Benedetta
AU - Amenitsch, Heinz
AU - Torvisco, Ana
AU - Velásquez-Hernández, Miriam de J.
AU - Falcaro, Paolo
AU - Ameloot, Rob
PY - 2021/1
Y1 - 2021/1
N2 - Metal–organic frameworks (MOFs) offer disruptive potential in micro- and optoelectronics because of the unique properties of these microporous materials. Nanoscale patterning is a fundamental step in the implementation of MOFs in miniaturized solid-state devices. Conventional MOF patterning methods suffer from low resolution and poorly defined pattern edges. Here, we demonstrate the resist-free, direct X-ray and electron-beam lithography of MOFs. This process avoids etching damage and contamination and leaves the porosity and crystallinity of the patterned MOFs intact. The resulting high-quality patterns have excellent sub-50-nm resolution, and approach the mesopore regime. The compatibility of X-ray and electron-beam lithography with existing micro- and nanofabrication processes will facilitate the integration of MOFs in miniaturized devices.
AB - Metal–organic frameworks (MOFs) offer disruptive potential in micro- and optoelectronics because of the unique properties of these microporous materials. Nanoscale patterning is a fundamental step in the implementation of MOFs in miniaturized solid-state devices. Conventional MOF patterning methods suffer from low resolution and poorly defined pattern edges. Here, we demonstrate the resist-free, direct X-ray and electron-beam lithography of MOFs. This process avoids etching damage and contamination and leaves the porosity and crystallinity of the patterned MOFs intact. The resulting high-quality patterns have excellent sub-50-nm resolution, and approach the mesopore regime. The compatibility of X-ray and electron-beam lithography with existing micro- and nanofabrication processes will facilitate the integration of MOFs in miniaturized devices.
UR - http://www.scopus.com/inward/record.url?scp=85093852435&partnerID=8YFLogxK
UR - https://www.nature.com/articles/s41563-020-00827-x
U2 - 10.1038/s41563-020-00827-x
DO - 10.1038/s41563-020-00827-x
M3 - Article
AN - SCOPUS:85093852435
VL - 20
SP - 93
EP - 99
JO - Nature Materials
JF - Nature Materials
SN - 1476-1122
IS - 1
ER -