TY - JOUR
T1 - Performance studies of the CE-65v2 MAPS prototype structure
AU - Plörer, Eduardo
AU - Lorenzetti, Alessandra
AU - Ilg, Armin
AU - Baba, Hitoshi
AU - Baudot, Jerome
AU - Besson, Auguste
AU - Bugiel, Szymon
AU - Chujo, Tatsuya
AU - Colledani, Claude
AU - Dorokhov, Andrei
AU - El Bitar, Ziad
AU - Goffe, Mathieu
AU - Gunji, Taku
AU - Hu-Guo, Christine
AU - Jaaskelainen, Kimmo
AU - Katsuno, Towa
AU - Kluge, Alexander
AU - Kostina, Anhelina
AU - Kumar, Ajit
AU - Macchiolo, Anna
AU - Mager, Magnus
AU - Park, Jonghan
AU - Sakai, Shingo
AU - Senyukov, Serhiy
AU - Shamas, Hasan
AU - Shibata, Daito
AU - Snoeys, Walter
AU - Stanek, Pavel
AU - Šuljić, Miljenko
AU - Tomasek, Lukas
AU - Valin, Isabelle
AU - Wada, Reita
AU - Yamaguchi, Yorito
N1 - Publisher Copyright:
© 2025 The Author(s)
PY - 2025/3/1
Y1 - 2025/3/1
N2 - With the next upgrade of the ALICE inner tracking system (ITS3) as its primary focus, a set of small MAPS test structures have been developed in the 65 nm TPSCo CMOS process. The CE-65 focuses on the characterisation of the analogue charge collection properties of this technology. The latest iteration, the CE-65v2, was produced in different processes (Standard, with a low-dose n-type blanket, and blanket with gap between pixels), pixel pitches (15, 18, 22.5 µm) and pixel arrangements (square or staggered). The comparatively large pixel array size of 48×24 pixels in CE-65v2 allows the uniformity of the pixel response to be studied, among other benefits. The CE-65v2 chip was characterised in a test beam at the CERN SPS. A first analysis showed that hit efficiencies of ≥ 99% and spatial resolution better than 5 µm can be achieved for all pitches and process variants. For the Standard process, thanks to larger charge sharing, even spatial resolutions below 3 µm are reached, in line with vertex detector requirements for the FCC-ee. This contribution further investigates the data collected at the SPS test beam. Thanks to the large sensor size and efficient data collection, a large amount of statistics was collected, which allows for detailed in-pixel studies to see the efficiency and spatial resolution as a function of the hit position within the pixels. Again, different pitches and process variants are compared.
AB - With the next upgrade of the ALICE inner tracking system (ITS3) as its primary focus, a set of small MAPS test structures have been developed in the 65 nm TPSCo CMOS process. The CE-65 focuses on the characterisation of the analogue charge collection properties of this technology. The latest iteration, the CE-65v2, was produced in different processes (Standard, with a low-dose n-type blanket, and blanket with gap between pixels), pixel pitches (15, 18, 22.5 µm) and pixel arrangements (square or staggered). The comparatively large pixel array size of 48×24 pixels in CE-65v2 allows the uniformity of the pixel response to be studied, among other benefits. The CE-65v2 chip was characterised in a test beam at the CERN SPS. A first analysis showed that hit efficiencies of ≥ 99% and spatial resolution better than 5 µm can be achieved for all pitches and process variants. For the Standard process, thanks to larger charge sharing, even spatial resolutions below 3 µm are reached, in line with vertex detector requirements for the FCC-ee. This contribution further investigates the data collected at the SPS test beam. Thanks to the large sensor size and efficient data collection, a large amount of statistics was collected, which allows for detailed in-pixel studies to see the efficiency and spatial resolution as a function of the hit position within the pixels. Again, different pitches and process variants are compared.
UR - http://www.scopus.com/inward/record.url?scp=105000416461&partnerID=8YFLogxK
U2 - 10.1088/1748-0221/20/03/C03033
DO - 10.1088/1748-0221/20/03/C03033
M3 - Article
SN - 1748-0221
VL - 20
JO - Journal of Instrumentation
JF - Journal of Instrumentation
IS - 3
M1 - C03033
ER -