An ex situ and operando analysis of thiourea consumption and activity during a simulated copper electrorefining process

Thomas Marcel Collet, Benny Wouters, Sebastiaan Eeltink, Philipp Schmidt, Kristof Ramharter, Annick Hubin

Onderzoeksoutput: Articlepeer review

1 Citaat (Scopus)


Electroreduction is an essential electrochemical technique, applied in many industries. The process can be used to produce coatings, circuit boards, to refine metals, etc. Electroreduction during plating or refining is assisted by organic or inorganic additives present in the electrolyte, with the aim to produce smooth metal deposits. A complex component of most additive mixtures in copper refining is thiourea. This work applies a coupled approach to study the time dependent characteristics of thiourea in a copper plating solution. Operando Odd Random Phase Electrochemical Impedance Spectroscopy (ORP-EIS) is used to study the electrochemical behavior of the plating solution during the process of plating while the concentration of thiourea is determined using ion chromatography. The combination of these techniques allows an in-depth study of the plating process, describing the additive behavior in the bulk electrolyte and the additive impact on the cathode plating process.
Originele taal-2English
Pagina's (van-tot)1-11
Aantal pagina's11
TijdschriftJournal of Electroanalytical Chemistry
StatusPublished - 1 sep 2022

Bibliografische nota

Funding Information:
This research is financially supported by Flanders Innovation and Entrepreneurship (VLAIO grant HBC.2017.0212) and Aurubis Olen NV. Dr. José Luís Dores-Sousa (VUB) is greatly acknowledged for his advise with the chromatography experiments.

Publisher Copyright:
© 2022 Elsevier B.V.

Copyright 2022 Elsevier B.V., All rights reserved.


  • Copper reduction Thiourea Operando ORP-EIS Ion chromatography Time-varying impedance
  • ion chromatography
  • operando ORP-EIS
  • thiourea
  • copper reduction


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